Dai Nippon Printing has selected HamaTech’s ‘MaskTrack Pro’ TeraPure system for cleaning imprint photomasks made for Nano-Imprint Lithography (NIL) tools. The system is scheduled for installation at the DNP facility in Japan in January 2010.
“Pristine, defect-free master imprint masks are critical for low-cost NIL mask replication” said Mr. Naoya Hayashi, research fellow at DNP “HamaTech is the one company in the industry today that has demonstrated the best cleaning technology for advanced master imprint mask and replica integrity requirements of tomorrow. Our selection of the MaskTrack Pro TeraPure and collaborative research efforts with HamaTech and other industry partners provides us with access to innovative technology to meet the semiconductor industry’s emergent lithography demands for a production-ready NIL infrastructure at the 22nm hp node.”
“TeraPure is the first system in the industry that can address NIL zero tolerance levels for particles and defects on the master mask and replica, securing pattern integrity and surface conditions for a cost-effective imprint,” commented Wilma Koolen-Hermkens, CEO of HamaTech APE. “DNP is our partner of choice to jointly develop the necessary processes of record (PORs) for the successful introduction of NIL.”