Online information source for semiconductor professionals

Tool Order: GenISys adds more research labs to Layout BEAMER software

07 March 2008 | By Mark Osborne | News > Lithography

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

GenISysGenISys GmbH has said that a further three U.S. research institutions have adopted its advanced e-beam lithography software, namely, Oak Ridge National Laboratory, Argonne National Laboratory and the California Institute of Technology.

“GenISys is dedicated to offering needed solutions for e-beam direct write. They are responsive and fast in development, and they are providing the support needed for implementing their advanced solutions into our research and our user program,” said Scott Retterer, Research Scientist in the Center for Nanophase Material Science at Oak Ridge National Laboratory.

Layout BEAMER integrates proximity effect correction (PEC) software specific to e-beam lithography requirements with data-preparation and process simulation and correction.

Related articles

New Product: GenISys new software speeds e-Beam lithography data-prep - 02 November 2006

SUSS MicroTec and GenISys team on mask aligner optimization - 21 February 2012

Tool Order: UMC places US$25.7 million order with Lam Research - 13 June 2011

New Product: Invarium offers ‚??wet‚?? versus ‚??dry‚?? lithography patterning synthesis trade-offs: - 18 September 2006

New Product: SoftJin‚??s NxDAT mask defect analysis software boots inspection productivity - 26 September 2008

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: