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Tool Order: GenISys adds more research labs to Layout BEAMER software
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GenISys GmbH has said that a further three U.S. research institutions
have adopted its advanced e-beam lithography software, namely, Oak
Ridge National Laboratory, Argonne National Laboratory and the
California Institute of Technology.
“GenISys is dedicated to offering needed solutions for e-beam direct
write. They are responsive and fast in development, and they are
providing the support needed for implementing their advanced solutions
into our research and our user program,” said Scott Retterer, Research
Scientist in the Center for Nanophase Material Science at Oak Ridge
National Laboratory.
Layout BEAMER integrates proximity effect
correction (PEC) software specific to e-beam lithography requirements
with data-preparation and process simulation and correction.