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Tool Order: FSI‚??s new ‚??ORION‚?? single wafer cleaning system in 32nm BEOL evaluation

20 May 2008 | By Mark Osborne | News > Wafer Processing

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ORIONA major semiconductor manufacturer has selected a single wafer cleaning system dubbed ‘ORION’ from FSI International, which has yet to be officially announced. The tool will be used for 32nm BEOL cleaning processes that specifically handle low-k materials.

“We have taken a very deliberate approach in the development of our single wafer cleaning technology, focusing on translating our considerable experience and expertise into a tool that will meet the industry’s advancing requirements,” commented Don Mitchell, FSI chairman and CEO.

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