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Tool Order: FSI wins multiple ZETA spray cleaning system orders from Korea, Japan and Europe

17 April 2008 | By Mark Osborne | News > Wafer Processing

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FSIFSI International has received a series of orders from new customers in Korea, Japan and Europe for its ‘ZETA’ spray cleaning systems including its ‘ViPR’ spray batch technology. The ViPR technology is claimed to eliminate the ashing process from the majority of photoresist stripping sequences and to effectively remove residual metals following advanced salicide processes.

“Over the last two years we have successfully implemented our ViPR technology in manufacturing with our development partners and are now experiencing broader customer interest and orders,” commented Don Mitchell, FSI’s chairman and CEO. “Our ZETA ViPR technology is in 300mm production at the world’s largest memory manufacturers and leading integrated circuit foundries. We are also seeing growing interest from 200mm fabs seeking to upgrade their technology while lowering their manufacturing costs.”

FSI claims that ZETA ViPR batch spray processing is faster and has lower chemical consumption than single wafer spray systems as well as greater control of chemical and temperature conditions and lower risk of contamination than batch immersion systems.

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