Online information source for semiconductor professionals
Tool Order: Fraunhofer IOF selects UV-NIL system from EV Group
Popular articles
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
The Fraunhofer Institute for Applied Optics and Precision Engineering IOF, has selected EVG's UV-based nanoimprint lithography (UV-NIL) step and repeat system for its leading-edge optoelectronic research efforts. The Institute will be using the UV-NIL stepper for micro-lens mastering and molding for a host of micro-optics applications, including fiber optics and CMOS image sensors for wafer-level cameras.
"We are continuing to push the envelope in micro-optics research, and as such are looking for equipment partners that offer flexible, innovative, yet cost-effective systems that keep us on the cutting edge," said Dr. Peter Dannberg, group leader "Micro-optics Technology" of Fraunhofer IOF. "After evaluating solutions from several nanoimprint lithography suppliers, we ultimately selected EVG's system following positive demo results as well as for its superior micro-lens mastering and nanoimprinting capabilities. The process flexibility its UV-NIL stepper offers is a significant value add as well since it provides us with the ability to utilize it for a variety of applications."
"This opportunity to partner with a bellwether research institute such as Fraunhofer IOF is significant to us on many levels," noted Dr. Thomas Glinsner, head of product management for EV Group. "EVG's history is deeply rooted in serving R&D environments where there is a need for high-performance tools that are flexible and cost effective.”