Online information source for semiconductor professionals
Tool Order: Foundry places multi-system metrology order for 22nm gate etch OCD with Nanometrics
Popular articles
Voltaix names Peter Smith as CEO - 09 November 2011
Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010
TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
A leading semiconductor foundry has placed a multi-system order with
Nanometrics for its Integrated Metrology (IM) and ‘NanoCD’ suite of
optical critical dimension (OCD) metrology solutions. The systems will
be delivered in the fourth quarter of 2009.
“The IM systems will be fully integrated onto advanced etch process systems from two leading etch equipment suppliers at multiple steps in the gate formation loop,” noted Steve Bradley, Director of Nanometrics’ Integrated Metrology Business Unit. “The customer will deploy our 9010T IM systems combined with our NanoDiffract OCD software and NanoGen cluster computing hardware, enabling complex 3D gate metrology and rigorous real-time analysis to allow rapid information turns in a dynamic technology development factory.”
Both TSMC has recently announced increases in capital spending for 2009 including an increase in R&D allocation and staff. UMC has also increased its emphasis on leading-edge R&D and plans higher capital spending in 2010.