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Tool Order: Foundry places multi-system metrology order for 22nm gate etch OCD with Nanometrics

03 November 2009 | By Mark Osborne | News > Wafer Processing

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9010T Series Integrated Metrology Optical CD & Film Analysis SystemA leading semiconductor foundry has placed a multi-system order with Nanometrics for its Integrated Metrology (IM) and ‘NanoCD’ suite of optical critical dimension (OCD) metrology solutions. The systems will be delivered in the fourth quarter of 2009.

“The IM systems will be fully integrated onto advanced etch process systems from two leading etch equipment suppliers at multiple steps in the gate formation loop,” noted Steve Bradley, Director of Nanometrics’ Integrated Metrology Business Unit. “The customer will deploy our 9010T IM systems combined with our NanoDiffract OCD software and NanoGen cluster computing hardware, enabling complex 3D gate metrology and rigorous real-time analysis to allow rapid information turns in a dynamic technology development factory.”

Both TSMC has recently announced increases in capital spending for 2009 including an increase in R&D allocation and staff. UMC has also increased its emphasis on leading-edge R&D and plans higher capital spending in 2010.

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