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Tool order: EV Group to ship photoresist tool to University of Tokyo

17 March 2009 | By Síle Mc Mahon | News > Lithography

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EV GroupEV Group has announced that it has received an order from a new customer for one of its EVG101D photoresist tools. The University of Tokyo will install the tool in its Class 1 cleanroom in the Takeda Sentanchi Building.

The University will use the tool for development of 100nm-and-smaller patterns on masks and wafers up to 200mm at the research facility, which patterns will be created by an e-beam lithography system. 
 
“The EVG100 series is a flexible toolset that can be modified to serve as a spray or spin coater, which is ideal for an R&D environment,” said Yuichi Otsuka, Representative Director of EV Group Japan K.K. “Additionally, this photoresist processing series is capable of coating patterned wafers, which is suitable for MEMS production.”

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