
ETH Zurich has ordered an electron-beam lithography tool from Vistec Lithography. The Vistec EBPG5200 will be installed in a new Nanotechnology Center, which has been established in partnership between IBM Research – Zurich and ETH Zurich. The tool will be used for exploratory research aiming at nanotechnology applications such as MEMS/NEMS, nanowires and carbon-based devices, amongst others.
According to the evaluation team, the primary reason the Nanotechnology Center selected the Vistec system was the advanced technology capabilities it offered, which include its ability to generate structures less than 8nm on varying substrates sizes.