Online information source for semiconductor professionals
Tool Order: Cymer installs first field-selectable 60â??90 watt immersion light source
Popular articles
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010
A large Asian-based IC manufacturer are installed Cymer’s XLR 600ix field-selectable 60 watt–90 watt, immersion light source into a Nikon scanner system, making it the first immersion light source of this kind to be installed. Cymer also claimed that all of the industry’s immersion double patterning light source selections in 2009 have been awarded to the company.
“Cymer’s XLR 600ix, with 90W capability, enables our scanners to meet chipmakers’ high throughput requirements for double patterning at the 32 nm process node and beyond,” said Mr. Toshikazu Umatate, Vice President, Precision Equipment Company, Nikon Corporation.
“Cymer is committed to providing solutions that enable next-generation lithography, and we’re proud to strengthen our partnership with Nikon through this installation, while enabling their customer to advance its competitive position with this leading-edge tool,” said Ed Brown, President and Chief Operating Officer for Cymer.
The XLR 600ix was launched in February 2009.