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Tool order: Cymer announces first 90W XLR 600i purchase
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aCymer, Inc. has announced the industry’s first purchase of two of its
90W ArF XLR 600i light sources for applications in volume immersion and
double patterning lithography at the 32nm node and beyond. The tool was
demonstrated in April at Nikon’s Kumagaya, Japan facility, and it is
believed that the tools were purchased by Nikon following the
successful demonstration of its abilities and applications.
"This milestone purchase—the industry’s first for a 90W system—affirms Cymer’s leadership in developing and commercializing technology that enables the highest performance at the lowest operating cost.” said Ed Brown, President and COO of Cymer. “The XLR platform is quickly becoming the standard for next-generation ArF lithography, as evidenced by the growing adoption of our XLR series by scanner manufacturers and chipmakers.”
By Síle Mc Mahon