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Tool order: Cymer announces first 90W XLR 600i purchase

11 July 2008 | By Síle Mc Mahon | News > Lithography

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Arf XLR 600iaCymer, Inc. has announced the industry’s first purchase of two of its 90W ArF XLR 600i light sources for applications in volume immersion and double patterning lithography at the 32nm node and beyond. The tool was demonstrated in April at Nikon’s Kumagaya, Japan facility, and it is believed that the tools were purchased by Nikon following the successful demonstration of its abilities and applications.

"This milestone purchase—the industry’s first for a 90W system—affirms Cymer’s leadership in developing and commercializing technology that enables the highest performance at the lowest operating cost.” said Ed Brown, President and COO of Cymer. “The XLR platform is quickly becoming the standard for next-generation ArF lithography, as evidenced by the growing adoption of our XLR series by scanner manufacturers and chipmakers.”

By Síle Mc Mahon


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