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Tool Order: Chartered selects double-patterning solutions from Brion

02 November 2009 | By Mark Osborne | News > Lithography

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Chartered Semiconductor has adopted Brion Technologies computational lithography products for 45nm and below technology nodes, including Brion’s double-patterning solutions. Chartered will use ‘Tachyon’ OPC+ (optical proximity correction), Tachyon LMC (lithography manufacturability check), and Tachyon resolution enhancement products, which enable the foundry to select the optimum combination of techniques for each design and every layer, which help to minimize lithography costs.

“Chartered is committed to providing its customers with robust and cost-effective manufacturing solutions. ASML’s and Brion’s integrated suite of lithography products for process development, mask design and litho manufacturing enables Chartered to offer advanced technology solutions that are optimized for higher yields,” said Liang Choo Hsia, Senior Vice President of Technology Development at Chartered.

Chartered is set to be acquired by privately held GlobalFoundries. Brion Technologies is owned by ASML, which is the main lithography equipment supplier to Chartered and GlobalFoundries.

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