Online information source for semiconductor professionals

Tool Order: Axcelis‚?? strip system becomes tool of record at large IC manufacturer

17 December 2010 | By Mark Osborne | News > Wafer Processing

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

One of the world's largest semiconductor manufacturers has selected Axcelis Technologies ‘Integra’ ES plasma dry strip system as the process tool of record. The company has received the first in a series of expected orders, which will be used to support the customer's 32nm and 28nm technology manufacturing capacity expansion. Axcelis said the tools would begin shipping in December 2010.

"The Integra ES was selected to perform photoresist strip levels over sensitive high-K and metal gate materials, after an extensive evaluation and process development program. Our customer was attracted to the device performance benefits achieved when running the resist strip processes over sensitive gate stack materials with non-oxidizing chemistries," said Bill Bintz, senior vice president of marketing for Axcelis Technologies.

Related articles

Tool Order: Mattson receives strip tool order for 2X NAND flash node development - 10 November 2008

Novellus‚?? resist strip system becomes tool of record at major Asian foundry - 16 September 2008

UMC makes Axcelis stripper ‚??tool of record‚?Ě - 17 October 2005

Tool Order: Japanese IC manufacturer purchases resist strip system from Mattson - 02 July 2008

Tool Order: Mattson wins strip system order for 32nm HKMG development - 20 October 2008

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: