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Tool Order: Axcelis gets high energy ion implant upgrade orders

30 September 2009 | By Mark Osborne | News > Wafer Processing

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Axcelis has received multiple orders for a low angle implant upgrade designed to deliver higher yields and improved device performance on high energy ion implanters. Axcelis said it had already made several successful installations of the upgrade.

“Customer results demonstrate that the ‘Low Angle Implant’ upgrade results in improved uniformity, enhanced device performance, higher packing density, reduced transistor threshold voltage variability and improved transistor matching. The upgrade also allows customers significant extendibility into future technology nodes, allowing them to maximize the return on their equipment investment."

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