A leading foundry customer in Asia has selected Mattson Technology’s new etch system, the paradigmE, the fourth customer to adopt the system, according to the company. Mattson said that the system had been evaluated by the customer on a range of challenging dielectric etch applications at leading technology nodes.
"The rapid adoption of our paradigmE system by both memory and foundry customers further validates the advancement we are making in dielectric etch,” commented Randy Matsuda, Senior Vice President and General Manager of Mattson Technology's Plasma Products Group. “Our unique ability to independently control ion energy and ion density while maintaining a very low energy level in the etch chamber allows our customers to realize enhanced process performance as well as improved yield. In addition, the paradigmE is built on our high-productivity platform and offers differentiated etch capabilities at low Cost-of-Ownership."