Online information source for semiconductor professionals

Texas Instruments and Matros Technologies win EPA’s Clean Air Excellence Award

03 July 2008 | By Mark Osborne | News > EHS

Popular articles

Voltaix names Peter Smith as CEO - 09 November 2011

Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010

TSMC hosts 2008 Green Forum on ‘green’ factories - 31 October 2008

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

TexasTexas Instruments has been recognized by the U.S. EPA for accomplishments in improving air quality and reducing greenhouse gas emissions. There were 11 winners of EPA’s Clean Air Excellence Awards, which included TI.

TI and Matros Technologies were recognized for an innovative clean air technology that was jointly developed for volatile organic compounds (VOC) abatement.

"This year's Clean Air Excellence Award winners' dedication to creating a cleaner tomorrow is truly a breath of fresh air," said EPA Administrator Stephen L. Johnson. "From local to state governments, companies to citizen groups, these award-winners are helping EPA deliver healthier air and healthier lives to all Americans."

According to TI, the installation of the Matros copper-chromium catalyst at a fab reduced NOx emissions and improved VOC performance. The catalyst installation made it possible to combine the low temperature of catalytic oxidation with the high thermal efficiency of regenerative heat exchange. The regenerative catalytic oxidizer operates using 50 to 60 percent less fuel and generates approximately 40 percent less NOx, TI said.

Related jobs

No related jobs found, sorry!

Related articles

Texas Instruments releases 2007 Supplier Excellence Award winner list - 08 April 2008

Richard Templeton receives 2007 SEMI Akira Inoue award - 03 February 2008

TSMC gives Cabot Microelectronics Supplier Award - 20 November 2008

Rohm and Haas receives Supplier Award from Hitachi Semiconductor Singapore - 18 April 2008

SEMI’s Akira Inoue Award for EHS Excellence bestowed on Toshiba’s Atsutoshi Nishida - 03 December 2008

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: