Online information source for semiconductor professionals
Synopsys to provide mask software tools to CEA-Letiâ??s IMAGINE Program
Popular articles
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
The IMAGINE program for maskless lithography, based on MAPPER’s lithography platform has received a boost with Synopsys joining the program and providing mask-based software solutions. CEA-Leti and MAPPER Lithography launched the program in July 2009.“Maskless lithography has emerged as a contender for extending IC manufacturing to technology nodes below 15 nanometers. The IMAGINE program brings together leaders from all areas of IC manufacturing in the assessment and deployment of this technology,” noted Fabio Angelillis, vice president engineering of the Silicon Engineering Group at Synopsys.
“One of the key points for the ML2 technology is the ability to handle very large data files, and we will need to quickly establish the proper data format standard,” added Serge Tedesco, CEA-Leti program manager. “Having Synopsys’ extensive experience in helping define data format and solutions to related issues will be essential to our success.”