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SUSS MicroTec and GenISys team on mask aligner optimization

21 February 2012 | By Mark Osborne | News > Lithography

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In a bid to enable easier modelling of large numbers of different source shapes, SUSS MicroTec and GenISys are teaming to jointly offer their products for mask aligner equipment. The cooperation means that GenISys’ ‘Layout LAB’ has been enhanced to accurately model all available SUSS MicroTec mask aligner exposure optics, including the SUSS MO Exposure Optics technology.

“The sophisticated and latest SUSS exposure optics technology, MO Exposure Optics, enables the use of frontend technologies like illumination shaping and mask layout optimization on mask aligner equipment,” noted Frank Averdung, President and CEO of SUSS MicroTec AG. “This in combination with GenISys simulation software is a key technology enabler as it allows easy modelling of large numbers of different source shapes.”

“Layout LAB is a professional full 3D simulation platform for optical proximity lithography, which enables to optimize mask layout and exposure conditions by running a large number of simulations overnight. Besides saving direct costs, users are gaining time to market,” claimed Nezih Unal, Vice President of GenISys.

The companies claim that the combination of lithography equipment and matching simulation software is a key for cost effective process and device development.

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