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STMicroelectronics to use Tachyon OPC+ for 45nm production

27 March 2008 | By Mark Osborne | News > Lithography

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BrionSTMicroelectronics has said that it is using Brion Technologies’ Tachyon OPC+ tools for 55 and 45nm production after the success of an earlier joint development program. STMicroelectronics has been using the Tachyon Lithography Manufacturing Check (LMC) for production at 90nm and 65nm nodes.

“Tachyon’s predictable run times, reliable performance and yield-sensitive inspection has had a positive impact on our advanced OPC flow deployment process," said Joël Hartmann, Silicon Technology Development Director for STMicroelectronics, in Crolles, France. “Brion provides a clear economic benefit by delivering optimal cost of ownership as well as competitive technical solutions. We look forward to continuing this extremely productive collaboration.”

Both companies are working on scanner-specific data for 32nm production.

 

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