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SPIE 2012: Gigaphoton hits 7 watts of EUV power with production LPP light source

13 February 2012 | By Mark Osborne | News > Lithography

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Gigaphoton is contining its development program to achieve an output of 250W for its laser-produced plasma (LPP) light source, while confirming that its laser-produced plasma (LPP) light source, scheduled to be shipped in 2012, generated 7 watts of EUV power. According to ASML’s EUV roadmap, a 20W light source would be required by the end of 2011. Competitor, Cymer said in the third quarter of 2011 that it was shipping an 8W LLP upgrade to customers with a 20W source ready by the end of the year, yet in its 1Q12 conference call, accepted that this milestone had been delayed.

According to Gigaphoton its LLP systems 7W output was achieved with a Sn target (tin droplet) irradiated by a combination of solid-state laser pre-pulse and 2.7 kW, 90kHz carbon dioxide (CO2) laser main pulse.

The company said that a maximum of 0.3 mJ, 27W EUV light was obtained at the plasma point running the LPP light source at 30% duty cycle for one hour. This lower level of power could therefore be used for initial testing of current systems installed in the field, mainly at research facilities.

“The achievement of first light with a mass-production technology LPP light source confirms that Gigaphoton’s unique LPP light source solutions can be implemented to ensure stable performance and low-cost operation. I believe this will further increase momentum for device manufacturers to introduce EUV lithography tools as the next-generation lithography technology. We at Gigaphoton have already started operating a factory dedicated to initial mass-production of LPP light sources in order to meet our customers’ requests for shipment in 2012. So, we remain on track to prepare for the EUV business,” said Dr Yuji Watanabe, president of Gigaphoton.

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