Another Japanese photoresist supplier has teamed with SEMATECH to develop EUV resists for use at the 22nm node and beyond. Shin-Etsu Chemical will gain access to two micro-exposure tools (METs) located at the University at Albany’s College of Nanoscale Science and Engineering and University of California at Berkeley, as well as several advanced metrology tools to help develop the highly sensitive resists required for EUV lithography.
“The cutting-edge research and development that is necessary for the commercialization of EUVL technology will be further enhanced by the addition of Shin-Etsu,” said Richard Brilla, CNSE Vice President for Strategy, Alliances and Consortia. “This new partnership will build on the world-class capabilities at the UAlbany NanoCollege in support of the advanced technology needs of our global corporate partners and the nanoelectronics industry.”
Shin-Etsu follows TOK, which joined the development team at SEMATECH in April, 2009. Photoresist sensitivity and Line Edge Roughness (LER) are still proving problematic for EUV developers.