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Shanghai Hua Hong NEC selects Anchor Semiconductor’s DFM tools for sub-130nm

13 May 2008 | By Mark Osborne | News > Lithography

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Anchor SemiconductorShanghai Hua Hong NEC Electronics has adopted Anchor Semiconductor’s ‘NanoScope’ DFM tools for sub-130nm production. The main application areas include full chip post-RET/OPC verification and design-related manufacturing defect characterization.

“Through a competitive evaluation, we reached the conclusion that Anchor's software-based solution provides the best combination in accuracy, performance, cost of ownership, and ease of use. The new manufacturing challenges in Hua Hong NEC are quite unique with our push on low-k1 lithography,” said Dr. Shaoning Mei, Vice President and Chief Technology Officer of Hua Hong NEC. “The Anchor team has been very responsive in support to meet our demanding schedule and requirements, which allows us to quickly incorporate the NanoScope solution in our production flow as we ramp up to accommodate increasing customer designs for 130nm node. Moving forward, Hua Hong NEC will continue our partnership with Anchor in implementing solutions that will advance our capability and yields and aggressively enhance our competitiveness.”

“Anchor was able to provide Hua Hong NEC with the best product and engineering support,” said Dr. Chenmin Hu, CEO of Anchor Semiconductor. “We again have proven that Anchor’s platform-based software products meet a wide range of DFM applications and with the best financial return on investment for our customers.”

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