Online information source for semiconductor professionals

SEMICON: SUSS MicroTec to supply imec with first EUVL mask management system

13 July 2011 | By Mark Osborne | News > Lithography

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

SUSS MicroTec is to ship the first MaskTrack Pro InSync - the first holistic in-fab EUVL mask management offering to imec in Belgium, in August 2011. MTP InSync is a stand-alone or clustered handling system which seamlessly synchronizes mask cleaning, handling, inspection and storage in a single controlled environment.

“EUV lithography places tremendous demands on mask integrity at point-of-exposure,” said Frank P. Averdung, President and CEO of SUSS MicroTec AG. “Only MaskTrack Pro InSync, delivers the technology necessary to achieve a zero particle mask management environment, enabling chipmakers to capitalize on important lithography scanner availability. This state-of-the-art mask management system establishes our continued commitment to providing our customers with a mask integrity infrastructure for Next Generation Lithography.”

The MaskTrack Pro InSync is said to be the first mask management system available in the market that can interface directly with the specific EUV Dual Pod in a fully-controlled environment.

Related articles

IMEC and SUSS MicroTec join forces on wafer bonding development - 14 July 2009

Tool Order: SUSS MicroTec wins 300mm ProbeShield system order - 05 September 2008

SUSS MicroTec ships 300mm TSV tool to Japan - 25 August 2009

Tool Order: SUSS MicroTec supplies spin coater to Replisaurus - 09 July 2008

SUSS MicroTec and GenISys team on mask aligner optimization - 21 February 2012

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: