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SEMICON: Globalfoundries collaborating with Intermolecular on deposition processes

13 July 2011 | By Mark Osborne | News > Wafer Processing

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A multiyear Collaborative Development Program (CDP) and IP licensing agreement has been signed between Globalfoundries and Intermolecular to enable a fast-track method to develop process modules that will be integrated into the foundry’s fabs, worldwide. Most of the development work will be performed at Intermolecular’s HPC (High Productivity Combinatorial) R&D Center in San Jose, California.

“Our business model is built on collaboration, both in customer engagement and technology development,” said Gregg Bartlett, Senior Vice President of Technology and Research and Development at Globalfoundries. “This new collaboration with Intermolecular will bolster our R&D pipeline and be an important enhancement to our ability to rapidly address integration challenges and transfer IP-protected solutions into high-volume manufacturing. We’re especially pleased to work with Intermolecular to accelerate development not just for our most advanced technology nodes, but also for mature production lines, where we provide a wide variety of scalable plug-in modules to help our customers meet the widest possible range of market opportunities.”

Intermolecular said that researchers and engineers from both companies would work side by side, utilizing Intermolecular’s full suite of ‘Tempus’ wet-workflow development systems and Tempus AP-30 platforms, which can perform ALD, CVD and PVD deposition processes.

 “This is an extensive and diverse engagement, covering technology nodes from 45 nanometers down to 14 nanometers, spanning multiple process and device integration applications. The objective of our collaboration with Globalfoundries is to strengthen and accelerate their customer product offerings for markets that require leading-edge, high-performance, low-power, volume manufacturing capabilities,” added, David Lazovsky, Intermolecular president and CEO.

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