Online information source for semiconductor professionals

Rite Track and Brewer Science to boost legacy litho track system performance

19 May 2009 | By Mark Osborne | News > Lithography

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

A new development partnership has been formed by Rite Track and Brewer Science to work on enhancing the performance of legacy track systems from TEL and SVG. Continued refinements of the platforms by Rite Track for customers will now have new process technologies offered by Brewer Science to extend track systems life-span in the field.

“Working together, we can shorten our development cycle for new products by taking advantage of Brewer Science’s extensive process expertise and applications lab capabilities,” stated John Noyes, Chief Technical Officer of Rite Track. “Additionally, integration of exciting new Brewer Science innovations onto mainstream production tracks provides a path from development with Brewer Science products to production on Rite Track modified systems with minimal re-qualification.”

Related articles

Rite Track receives its largest single legacy track system order - 24 June 2008

Joe Consolini joins Rite Track as Strategic Technology Business Consultant - 30 July 2008

Jason Rim promoted to spearhead Rite Track‚??s Asian semiconductor sales - 22 June 2010

Rite Track extends availability of parts for SVG 9X tracks - 11 February 2010

Brewer Science‚??s Taiwan lab to use EV Groups wafer bonder for TSV development - 07 January 2009

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: