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Rite Track and Brewer Science to boost legacy litho track system performance

19 May 2009 | By Mark Osborne | News > Lithography

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A new development partnership has been formed by Rite Track and Brewer Science to work on enhancing the performance of legacy track systems from TEL and SVG. Continued refinements of the platforms by Rite Track for customers will now have new process technologies offered by Brewer Science to extend track systems life-span in the field.

“Working together, we can shorten our development cycle for new products by taking advantage of Brewer Science’s extensive process expertise and applications lab capabilities,” stated John Noyes, Chief Technical Officer of Rite Track. “Additionally, integration of exciting new Brewer Science innovations onto mainstream production tracks provides a path from development with Brewer Science products to production on Rite Track modified systems with minimal re-qualification.”

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