Online information source for semiconductor professionals

Photomask market to decline to US$2.5 billion in 2009

28 April 2009 | By Mark Osborne | News > Lithography

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

The semiconductor photomask market is estimated to be US$2.9 billion in 2008 and forecasted to contract to US$2.5 billion in 2009, according to a new report available from SEMI. However, a recovery in demand is expected to see the photomask market return to growth in 2011, reaching US$2.7 billion.

Significantly more expensive masks are required for the 65nm and 45nm nodes as volume production ramps, suggesting unit demand may not be growing as much as the value of leading-edge masks.

Related articles

SEMI revises semiconductor equipment sales forecast - 02 December 2008

DRAM prices will hit bottom in Q109, says IC Insights - 27 February 2009

Semiconductor equipment sales to fall nearly 50% in 2009, says VLSI Research - 29 January 2009

DRAM industry revenue recovery sighted by iSuppli - 09 January 2009

SIA projects less optimistic growth than WSTS for 2010 - 09 June 2009

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: