Online information source for semiconductor professionals
Order Focus: Veeco ships TurboDisc MOCVD tool to LG Siltron
Popular articles
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
Veeco Instruments has revealed that it has received an order for one of its TurboDisc MOCVD tools from South Korean epi wafer manufacturer, LG Siltron. The TurboDisc tool is a K465i gallium nitride MOCVD system for production of gallium nitride on silicon (GaN-on-Si) wafers for power electronics and LED devices.
"We are pleased to have chosen the TurboDisc K465i MOCVD System as our first GaN-on-Si production system”, commented Dr. Hee Bog Kang, LG Siltron R&D’s general manager. “It offers unparalleled throughput advantages, and its TurboDisc technology provides superior uniformity and low particle count, which is critical for producing GaN-on-Si wafers. We appreciate the strong support we have received from Veeco, and look forward to this and future collaborations."