SEMATECH’s Mask Blank Development Center (MBDC), located at the College of Nanoscale Science and Engineering of the University at Albany has employed Eyelit's Manufacturing Execution (MES) software to assist efforts to reduce the number of defects that arise from the manufacturing process.
“We were rapidly outgrowing the capabilities of our system and needed an out-of-the-box solution that could grow with us,” stated Anne Rudack, SEMATECH’s EUV MBDC Operations Manager. “We were able to implement Eyelit in just eight weeks, while gaining the control and data discovery functions needed to meet our process improvement goals for the benefit of our members and partners.”
"It became increasingly difficult for SEMATECH to determine the origin of defects as more and more variables were introduced into the process. Variables, such as recipe use, cycle time, carrier use, and other critical factors, were not easily tracked in the existing system. Eyelit provided a clear path for obtaining these variable values in order to allow process engineers and researchers to quickly uncover the cause of defects,” commented Crispin Panyard, Vice-President of Operations for Eyelit.”
According to Eyelit, implementation of the MES was completed in just eight weeks.