Online information source for semiconductor professionals

Order Focus: Novellus reaches 100th shipment of VECTOR Extreme PECVD system

08 July 2011 | By Mark Osborne | News > Wafer Processing

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

Novellus Systems has reached a new milestone for its VECTOR Extreme plasma-enhanced chemical vapour deposition (PECVD) system, with the company shipping its 100th system. The VECTOR Extreme was introduced in July of 2007.

The VECTOR Extreme is a 300mm platform specifically designed to meet the needs of memory “mega-fabs,” defined as semiconductor manufacturing facilities with production outputs typically in excess of 100,000 wafers per month.

“Achievement of this milestone was only possible because VECTOR Extreme addresses a critical need of memory manufacturers, the need to lower cost,” noted Sesha Varadarajan, senior vice president of Novellus’ PECVD business unit. “Leveraging the inherent advantages of Novellus’ multi-station sequential processing architecture, VECTOR Extreme delivers the highest wafer output per unit area, resulting in the lowest cost of ownership relative to competing products.”

Related articles

New Product: Novellus adds ashable hard mask process to ‚??VECTOR Extreme‚?? PECVD platform - 26 November 2008

Milestone: Novellus ships 100th 300mm tool to Southeast Asia - 12 March 2008

Tool Order: Wuhan Xinxin Semiconductor selects VECTOR Express from Novellus - 19 March 2008

New Product: Novellus enters 300mmPrime time with Vector Extreme - 22 August 2007

Tool Order: Globalfoundries Fab 7 receives 1000th VECTOR PECVD system from Novellus - 02 February 2010

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: