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Nova’s 3090Next CD metrology system integrated into Sokudo’s RF3 track system
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Nova Measuring Instruments’ optical critical dimension (CD) metrology
platform has been qualified on Sokudo's RF3 coat/develop track systems,
the companies have said. The NovaScan 3090Next is an advanced metrology
platform for Optical CD Control and shape-profiling, implementing
polarized normal incidence spectroscopic scatterometry.
“We teamed with Nova to integrate optical metrology on our systems
because of Nova's strong optical CD and CD modeling technology,”
remarked Mohsen Salek, General Manager of Sokudo. “The addition of the
NovaScan(R) and NovaMARS platforms to Sokudo's products strengthens
Sokudo's ability to provide customers with the most advanced track
solutions.”
The result has seen less than 0.8nm 3 sigma CD
uniformity and can be applied to both dry and immersion lithography.
Sokudo's RF3S system with integrated NovaScan CD metrology began
shipping to customers in January 2008.