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Nova‚??s 3090Next CD metrology system integrated into Sokudo‚??s RF3 track system

27 February 2008 | By Mark Osborne | News > Lithography

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NOVANova Measuring Instruments’ optical critical dimension (CD) metrology platform has been qualified on Sokudo's RF3 coat/develop track systems, the companies have said. The NovaScan 3090Next is an advanced metrology platform for Optical CD Control and shape-profiling, implementing polarized normal incidence spectroscopic scatterometry.

“We teamed with Nova to integrate optical metrology on our systems because of Nova's strong optical CD and CD modeling technology,” remarked Mohsen Salek, General Manager of Sokudo. “The addition of the NovaScan(R) and NovaMARS platforms to Sokudo's products strengthens Sokudo's ability to provide customers with the most advanced track solutions.”

The result has seen less than 0.8nm 3 sigma CD uniformity and can be applied to both dry and immersion lithography. Sokudo's RF3S system with integrated NovaScan CD metrology began shipping to customers in January 2008.

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