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Nissan Chemical to work with SEMATECH on EUV materials

10 January 2011 | By Mark Osborne | News > Lithography

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Japanese chemical, Nissan Chemical has joined SEMATECH’s Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany. The company will collaborate with SEMATECH engineers on advanced adhesion enhancing materials in extreme ultraviolet (EUV) lithography such as edge roughness (LER), elimination of pattern collapse in images below 22 nm, and ultimate resolution of new resists.

“Our partnership with NCI will help strengthen the RMDC’s ability to address critical issues in adhesion enhancing materials,” said John Warlaumont, vice president of Advanced Technologies at SEMATECH “This new collaboration illustrates the effectiveness of SEMATECH’s efforts to include a broader range of industry participants in the search for new solutions to our common technology challenges.”

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