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Milestone: Gigaphoton installs 100th ArF light source

14 April 2008 | By Síle Mc Mahon | News > Lithography

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GigaphotonGigaphoton has reached a new milestone with its ArF light source platform with the installation of its 100th system at a major foundry based in Taiwan, according to the company. The GT40A model that was installed will be used in the production of 55nm to 65nm devices.

 "The installation our 100th GigaTwin light source is yet another example of the growing confidence surrounding our ArF platforms' capabilities and advantages, which contributed largely to our sales in 2007,” noted Gigaphoton President Dr. Yuji Watanabe. “We're excited to be sharing this milestone  installation with one of our most-valued customers, but more importantly, are extremely pleased to be a part of enabling this important foundry's leading-edge lithography processes."

Gigaphoton also said that sales of its ArF laser sources significantly exceeded that of its KrF sources in 2007, helping it to gain market share of rival Cymer. The company believed it had achieved a market share of 40 percent in 2007 based on unit sales.

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