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Major U.S. IC company orders Micronic’s Sigma7500 photomask pattern generator
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Swedish
company Micronic Laser Systems AB has received its second order of 2H08
for a Sigma7500 photomask pattern generator. This order, which comes
from an unnamed U.S.-based chip manufacturer, will see shipment of the
tool by the end of this year. The SLM imaging tool is used in photomask production
and is capable of handling applications from the 90nm node to the 45nm
node.
“These recent orders for the Sigma7500 confirm the value of the tool to companies producing photomasks that need cost-efficient capacity increase and at the same time to meet the demands for short lead times,” said Sven Löfquist, President and CEO of Micronic Laser Systems AB. “The photomask market is struggling not only with the downturn in the industry but also with a structural problem due to a decline in designs for advanced technology nodes below 100nm.”