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Major U.S. IC company orders Micronic‚??s Sigma7500 photomask pattern generator

04 December 2008 | By Síle Mc Mahon | News > Lithography

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Sigma 7000Swedish company Micronic Laser Systems AB has received its second order of 2H08 for a Sigma7500 photomask pattern generator. This order, which comes from an unnamed U.S.-based chip manufacturer, will see shipment of the tool by the end of this year. The SLM imaging tool is used in photomask production and is capable of handling applications from the 90nm node to the 45nm node.

“These recent orders for the Sigma7500 confirm the value of the tool to companies producing photomasks that need cost-efficient capacity increase and at the same time to meet the demands for short lead times,” said Sven Löfquist, President and CEO of Micronic Laser Systems AB. “The photomask market is struggling not only with the downturn in the industry but also with a structural problem due to a decline in designs for advanced technology nodes below 100nm.”

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Always faster than e-beam
By guest on 13 December 2008

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