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IMEC reveals Poly-SiGe micro-mirror array for photomask writers

15 December 2008 | By Mark Osborne | News > Lithography

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Poly-SiGe micro-mirror array for photomask writers As part of its CMORE initiative, IMEC is to present details of a new Poly-SiGe-based micro-mirror array that could be used for photomask writers and other industrial applications. IMEC said that its 10cm² 11 megapixel mirror array has a pixel density nearly twice that of comparable state-of-the-art micro-mirrors.

Using Poly-SiGe materials means that improvements in reliability and stability have been made. IMEC fabricated the 8μm x 8μm mirror arrays on top of foundry high-voltage 0.18µm CMOS 200mm wafers with 6 interconnect levels.

Caption: Cross-section of the integrated micro-mirror array, showing the mirrors on top of the 6 layers of interconnect

Micro-mirrors with 0.18µm CMOS technology, 200mm wafers with 6 interconnect levels

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