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IBM and Matheson Tri-Gas to develop ALD gas and delivery systems

28 April 2008 | By Mark Osborne | News > Materials and Gases

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IBMA collaboration between IBM and Matheson Tri-Gas, a subsidiary of Taiyo Nippon Sanso, Japan, has been signed to develop high purity gas molecules and new delivery systems for the 32nm node and below using atomic level deposition (ALD) techniques.

“Taiyo Nippon Sanso Group including Matheson Tri-Gas' cutting-edge source gases and advanced purification equipment, when integrated with IBM's state-of-the-art CMOS research capabilities, enables both companies to accelerate the pace of semiconductor innovation,” said Bernie Meyerson, Vice President Strategic Alliances and Chief Technical Officer for IBM Systems & Technology Group. “In our business model where we pool individual research strengths and intellectual property, we are able to reduce the significant costs associated with the research required to create the next generation of chip technology.”

“This relationship between Taiyo Nippon Sanso Corporation, Matheson Tri-Gas, and IBM sends a clear message to the global semiconductor community that the collaborative model that IBM and its partners have chosen is attractive for partners specializing in material, chemical and gas based solutions to technical challenges of the twenty-first century,” said Bill Kroll, Chairman, President, and Chief Executive Officer of Matheson Tri-Gas. “This relationship with IBM will enable the Taiyo Nippon Sanso Group to position itself as a leading-edge material supplier in the semiconductor material market beyond 32nm.”

Engineers from the two companies and Matheson Tri-Gas' parent company, Taiyo Nippon Sanso Corporation, will conduct joint research and development at the College of Nanoscale Science and Engineering’s Albany NanoTech Complex.

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