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Huazhong University partners with Vistec

13 April 2010 | By Mark Osborne | News > Lithography

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Vistec’s EBPG5000pES electron-beam lithography systemHuazhong University of Science and Technology (HUST) in Wuhan, China is teaming with Vistec Lithography for research and education of nanolithography. HUST is using Vistec’s EBPG5000pES electron-beam lithography system.

“With the new patterning system we are able to further strengthen our leading position in photonics and optoelectronics, which are the most powerful technologies of the 21st century,” commented Prof. Miao Xiangshui and Prof. Zhou Wenli from HUST.

The Vistec tool has an electron-optical column (TFE source) rated for acceleration voltages of 50 and 100kV, which provides a spot size down to <2.2nm, thus allowing nano-lithography structures smaller than 8nm to be routinely generated, according to the company.

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