A new innovative photomask pellicle removal tool designed by HAP GmbH of Dresden, Germany is to be exclusively sold and distributed by Carl Zeiss SMT. HAP is semiconductor automation, sub-systems and tool assembly outsourcing company that has worked with Zeiss on other equipment.
The ‘HAP Pellicle Removal Tool’ is claimed to be able to remove the pellicle from a photomask by applying a dedicated thermal and force recipe to the pellicle mount, which eliminates damage or binning of expensive photomasks.
“The cooperation with Carl Zeiss generates strong synergies for both companies. We can participate in the worldwide sales and service network of the SMS Division as well as their comprehensive expertise in the semiconductor industry. SMS can provide its customers in the mask making industry a new technology without their own R&D effort.” explains Dr. Steffen Pollack, Managing Director HAP.
IMAGE: Lothar Andritzke (Managing Director HAP), Dr. Oliver Kienzle (Managing Director Carl Zeiss SMS), Dr. Steffen Pollack (Managing Director HAP)(1st row from left to right) during the signing of the agreement supported by C. Sänn, Dr. A. Zibold, C. Ehrlich (Carl Zeiss SMS) (2nd row from left to right).