Online information source for semiconductor professionals

Gigaphoton‚??s GT63A next-gen ArF excimer laser ready for shipment in Q2‚??12

07 February 2012 | By Síle Mc Mahon | News > Lithography

Popular articles

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008

Sematech Litho Forum: Sematech mulling multi-beam mask writer effort - 12 May 2010

Gigaphoton's GT62AGigaphoton has added to its immersion lithography product range with the GT63A, a next-generation ArF excimer laser for multi-patterning immersion lithography scanners. The company has announced that the new product, which has been developed in response to customers’ needs and requests, will be ready for shipment in the second quarter of 2012.

The GT63A’s make-up incorporates what it calls “the four s” features: sMPL (Spectrum Multi-Positioning LNM), a spectrum control technology that delivers wider depth-of-focus; sGRYCOS (Sixty Gigaphoton Recycled Chamber Operation System), a chamber technology that lowers operating costs; sTGM (Supreme Total Gas Manager), a gas management system that is said to achieve higher uptime with less process gas use; and sMONITORING (Smart Monitoring), which provides real-time information management.

All these features are said to be compatible with existing GT60A, GT61A, and GT62A models.

"Our new and enhanced technologies have finally cleared the toughest hurdle, to enhance lithographic performance and throughput at a lower cost with the "s" series features introduced with the GT63A. Gigaphoton's chamber lifetime, focus drilling and gas management capabilities are now the standard for our industry. We believe that we will deliver more added value to our customers by starting shipment of the GT63A and upgrading existing GT60A series lasers," commented Dr. Yuji Watanabe, president of Gigaphoton.

Related articles

SPIE 2012: Gigaphoton hits 7 watts of EUV power with production LPP light source - 13 February 2012

New Product: Cymer‚??s new ‚??Gas Lifetime eXtension‚?? upgrade offers 10x better gas exchanges - 29 November 2007

New Product: Gigaphoton launches high NA laser light source for immersion tools - 05 January 2007

ASML drops foray into optical maskless lithography - 16 April 2009

Major U.S. IC company orders Micronic‚??s Sigma7500 photomask pattern generator - 04 December 2008

Reader comments

No comments yet!

Post your comment

Name:
Email:
Please enter the word you see in the image below: