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Gigaphotonâ??s GT63A next-gen ArF excimer laser ready for shipment in Q2â??12
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Gigaphoton has added to its immersion lithography product range with the GT63A, a next-generation ArF excimer laser for multi-patterning immersion lithography scanners. The company has announced that the new product, which has been developed in response to customers’ needs and requests, will be ready for shipment in the second quarter of 2012.
The GT63A’s make-up incorporates what it calls “the four s” features: sMPL (Spectrum Multi-Positioning LNM), a spectrum control technology that delivers wider depth-of-focus; sGRYCOS (Sixty Gigaphoton Recycled Chamber Operation System), a chamber technology that lowers operating costs; sTGM (Supreme Total Gas Manager), a gas management system that is said to achieve higher uptime with less process gas use; and sMONITORING (Smart Monitoring), which provides real-time information management.
All these features are said to be compatible with existing GT60A, GT61A, and GT62A models.
"Our new and enhanced technologies have finally cleared the toughest hurdle, to enhance lithographic performance and throughput at a lower cost with the "s" series features introduced with the GT63A. Gigaphoton's chamber lifetime, focus drilling and gas management capabilities are now the standard for our industry. We believe that we will deliver more added value to our customers by starting shipment of the GT63A and upgrading existing GT60A series lasers," commented Dr. Yuji Watanabe, president of Gigaphoton.