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Energetiq Technology receives award at International EUVL Workshop

21 July 2009 | By Emma Hughes | News >

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EUV Energetiq Technology Inc., short-wavelength light products manufacturer and supplier, has been given an Outstanding Contribution Award at the 2009 International Workshop for EUV Lithography.

The prize was awarded for the performance of the Energetiq EUV light source and the company's contribution to EUVL development. Only two awards were given at the Workshop held last week in Honolulu, Hawaii - the one to Energetiq and the other to a renowned professor in EUV development for his lifetime career achievement.

Professor Gregory Denbeaux of the University at Albany presented the award to Deborah Gustafson, VP of Marketing and Sales at Energetiq. Professor Denbeaux said, "Energetiq has made it possible for researchers to have reliable EUV photons to make EUV lithography become a reality. Much of today's research is conducted with the Energetiq EUV light source."

Energetiq's EQ-10 Series EUV Light Source features the company's proprietary Electrodeless Z-Pinch ((TM)) technology and produces stable EUV light, with low cost of ownership.

The electrodeless source design is proven to run continuously and have highly repeatable performance. The EQ-10 Series is installed at major EUV technology centers in the USA, Europe and Asia, and is used in advanced photoresist testing and qualification, EUV optics testing, EUV microscopy, and most recently with the introduction of a high repetition rate (10 kHz) version, in metrology and research applications where simulation of HVM (High Volume Manufacturing) is required.

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