Online information source for semiconductor professionals
E-beam technology takes collective stage at SPIE Lithography Symposium
Popular articles
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
New Product: ASML Brionâ??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011
The eBeam Initiative has highlighted that several of its members will present the latest breakthroughs in DFEB mask and direct write technology at the Annual SPIE Advanced Lithography Symposium 2011. At the SPIE Advanced Lithography Symposium, eBeam Initiative members will present the following papers or posters:
March 1
8:15 a.m., Alternative Lithographic Technologies III Conference, Session 1: Keynote - "A comparison of maskless technologies" presented by Aki Fujimura, CEO of D2S, managing sponsor of the eBeam Initiative
1:50 p.m., Alternative Lithographic Technologies III Conference, Session 3: Maskless Lithography I - "MCC8: Throughput enhancement of EB direct writer" presented by Advantest
2:50 p.m., Alternative Lithographic Technologies III Conference, Session 3: Maskless Lithography I - "Multishaped Beam: Development status and update on lithography results" presented by Vistec Electron Beam GmbH
March 2
5:20 p.m., Alternative Lithographic Technologies III Conference, Session 8: Maskless Lithography II - "Model-based mask data preparation (MB-MDP) and impact on resist heating" presented by D2S and NuFlare Technology
6:00-8:00 p.m., Optical Microlithography XXIV Conference, Poster Session: Mask/Wafer Topography, Layout, and OPC - "Mask data correction methodology in the context of MB-MDP and advanced mask models" presented by D2S and IC Images Technologies
March 3
11:50 a.m., Alternative Lithographic Technologies III Conference, Session 10: Maskless Lithography III - "Fast characterization of line-end shortening and application of novel LES correction algorithms in e-beam direct write" presented by EQUIcon, Fraunhofer-CNT and Vistec Electron Beam GmbH
In addition to these collaborative papers, a new white paper on DFEB mask technology and overlapping e-beam shots is available on the eBeam Initiative's website.
The eBeam Initiative also announced that four additional companies have joined its ranks. These new members—Artwork Conversion, Grenon Consulting, NCS and Xilinx—strengthen the ecosystem that is critical to supporting the commercialization of DFEB technology.