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Cymer touts 100 watts average power in time for 2009 production ready EUV tools
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Cymer said at this week's Sematech EUV Source Workshop in New York that
it has reached a milestone 25 watts of average extreme ultraviolet
(EUV) power continuously for 1 1/2 hours' duration, and is on track to
achieve the 100 watts of average power needed for production-ready EUV
lithography tools in 2009.
“Just three months after achieving 35 watts of EUV power for a short
burst, Cymer has made significant progress in reaching 25 watts of
average EUV power for more than one hour,” said Ed Brown, President and
Chief Operating Officer for Cymer. “This power and duration achievement
paired with the completion of our EUV manufacturing facility reflects
Cymer’s commitment to EUV and the commercialization of future
lithography tools.”
Cymer has developed a laser-produced
plasma (LPP) system consisting of a multi-staged carbon dioxide laser
and tin droplet target.