Online information source for semiconductor professionals

Cymer touts 100 watts average power in time for 2009 production ready EUV tools

14 May 2008 | By Mark Osborne | News > Lithography

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

CymerCymer said at this week's Sematech EUV Source Workshop in New York that it has reached a milestone 25 watts of average extreme ultraviolet (EUV) power continuously for 1 1/2 hours' duration, and is on track to achieve the 100 watts of average power needed for production-ready EUV lithography tools in 2009.

“Just three months after achieving 35 watts of EUV power for a short burst, Cymer has made significant progress in reaching 25 watts of average EUV power for more than one hour,” said Ed Brown, President and Chief Operating Officer for Cymer. “This power and duration achievement paired with the completion of our EUV manufacturing facility reflects Cymer’s commitment to EUV and the commercialization of future lithography tools.”

Cymer has developed a laser-produced plasma (LPP) system consisting of a multi-staged carbon dioxide laser and tin droplet target.

Related articles

Solar-charged Kobe: SPI to install PV systems at L.A.‘s Staples Center, Nokia Theatre - 13 August 2008

SPIE 2012: Gigaphoton hits 7 watts of EUV power with production LPP light source - 13 February 2012

Pulse taking - 22 October 2008

New Product: Cymer‚??s 90W XLR 600i laser designed for immersion and Double Patterning - 13 September 2007

Tool Order: Toshiba selects Cymer as 300mm fab laser light source supplier - 08 July 2008

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: