Major orders placed with Cymer in the second half of 2010 have begun to translate into an increased level of lithography light source shipments in the first quarter of 2011 as the company shipped 50 light sources in the first quarter of 2011. Revenue totalled US$154.4 million compared to revenue of US$113.8 million in the first quarter of 2010, and revenue of US$146.9 million in the fourth quarter of 2010.
Cymer shipped 28 ArF immersion light sources, 19 KrF, and three ArF dry systems, while the company installed 46 light sources at chipmaker locations in the first quarter.
DUV bookings for the first quarter of 2011 totalled US$161.5 million, resulting in a DUV book-to-bill ratio of 1.05. ArF immersion bookings in the quarter equated to 57% of total bookings while ArF immersion bookings resulted in 41% of bookings.
The company ended the quarter with a DUV backlog of US$71.0 million, with ArF immersion light sources comprising approximately 83% of the value of sources in backlog.
"We are well positioned for continued growth in 2011. We are pleased to have received a multi-unit order valued at over two hundred million dollars for the next generation of EUV light sources that will support the ASML NXE:3300 lithography system aimed at high-volume production of semiconductor devices at sub-20 nanometer nodes,” commented Bob Akins, Cymer's chief executive officer. “We believe EUV will be a major impetus of future growth for Cymer and are therefore proportionately accelerating the rate of our investment in engineering, program management, field support and factory capacity keeping with planned source performance targets and increasing customer demand.”
During Intel’s recent quarterly conference call, executives highlighted that the increase in CapEx of approximately US$1 billion was due in part to increased investments in 14nm capabilities, a technology node insertion opportunity for EUV lithography at Intel.
Cymer guided second quarter revenue of approximately US$157 million with gross margin to be approximately 50%.