
IBM has said that its Common Platform alliance partners, Chartered
Semiconductor and Samsung, will start offering prototype shuttle
services for a partner-developed 32nm high-k/metal gate (HKMG) process
in the third quarter of 2008.
The low-power 32nm process technology will also be available with
compatible ground rules for extendibility to the 28nm node. Work
carried out at the College of Nanoscale Science and Engineering’s
Albany NanoTech Complex indicates that this process can be extended to
22nm.
“The
semiconductor marketplace remains one of the most competitive in the
world. Early market introduction combined with strong product
differentiation is critical to success,” said Dirk Wrister, Director of
Process Technology at Freescale. "This early design and modeling work
indicates that the high-k/metal gate technology is going to deliver a
significant product and performance differentiation. These early
results are a significant step in the demonstration of high-k/metal
gate viability in 32nm technology."
IBM said that the 32nm prototype shuttle service will operate on a quarterly basis from the third quarter of 2008 onwards.