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CEA-Leti maskless lithography program gains STMicroelectronics

18 January 2010 | By Mark Osborne | News > Lithography

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STMicroelectronics has joined the CEA-Leti IMAGINE program, which is attempting to develop and asses the maskless lithography technology from MAPPER Technology. The three-year project also has TSMC as a partner. STMicroelectronics noted that after many years of using e-beam lithography for IC prototyping, joining the IMAGINE project was a logical move to find possible next-generation lithography solutions. TSMC has previously been critical of EUV costs and has actively supported e-beam development for volume production applications.

“The IMAGINE program will benefit from the strong knowledge and support of STMicroelectronics in maskless technology,” said Leti’s CEO, Laurent Malier. “The experience of CEA-Leti in e-beam technology has been strengthened over the years by this partnership with ST for using e-beam for advanced technology demonstrators. With STMicroelectronics supporting the IMAGINE program, we are convinced we will succeed to make maskless lithography a viable solution.”

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