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CEA-Leti and Entegris start 2-year study into cross-molecular contamination from wafer to carriers

15 July 2011 | By Mark Osborne | News > Cleanroom

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Citing the introduction of a range of new materials for advanced semiconductor fabrication processes, CEA-Leti and Entegris are to study cross-molecular contamination to and from semiconductor wafers and containers to identify potential yield impacts and draw-up limitation strategies. The 2-year study will be conducted at Leti’s 8,000m² cleanroom facilities with 200mm and 300mm pilot lines.

"Advanced technology nodes are increasingly sensitive to molecular contamination. Leti can characterize the microenvironment and correlate it to the sensitivity of critical substrates and surfaces," said Dr. Jim Ohlsen, Entegris director of materials characterization. "Entegris will contribute to the project by providing polymer materials and products based on our deep knowledge of material science and microenvironment control."

“This project is aligned with our roadmaps on the development of new methodologies analysis related to the study of all aspects of contamination in the semiconductor- production environment,” said Narciso Gambacorti, CEA-Leti program manager. “Leti will contribute its knowhow on contamination analysis, while Entegris will have the opportunity to test new polymer materials and new carrier designs in Leti’s production-like environment.”

Leti will share its high-level technical competencies in studying the contamination process together with access to its Nanocharacterization Platform, which can eventually provide complementary analytical techniques. Entegris will provide different microenvironment platforms designed to protect critical materials from molecular contaminants as well as share its expertise in material science.

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