After approximately 15 years in the making, Carl Zeiss has said that the first Extreme Ultraviolet Lithography (EUVL) optics system designed for volume production has now been shipped to ASML. The first wave of production EUV tools are expected to be shipped by ASML in the second half of 2010 and will have 60 wafers per hour throughput, according to the company.
Zeiss noted that it had invested more than €100 million in the optical systems required for EUV lithography. ASML has already received five orders for the EUVL production system, with deliveries starting in 2010.
“Fifteen years ago, we launched research and development of EUV Lithography and have invested far in excess of 100 million Euros since then,” noted Dr. Peter Kürz, EUV Program Director at Carl Zeiss SMT in Oberkochen. “To date, ASML has installed two process development tools around the globe. Now its use in the volume production of microchips is within reach.”