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Carl Zeiss and Synopsys team on in‚??die metrology solutions for the 32nm

28 October 2010 | By Mark Osborne | News > Lithography

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A collaboration to support Carl Zeiss’ photomask tool family for in–die metrology solutions for the 32nm node and below has begun with Synopsys. Using Synopsys’ CATS as the data preparation engine, mask engineers using Zeiss’ PROVE system are expected to benefit from improved efficiency and usability of a registration metrology system, specifically in overlay accuracy requirements.

The new CATS module for Synopsys is currently in limited customer availability and is expected to be generally available in March 2011. The module is claimed to enable fully automated flow for the setup of photomask metrology jobs, using open formats OASIS.MASK and XML.

“With Synopsys’ long-term experience in mask data preparation and Carl Zeiss’ know-how in in-die metrology, the new CATS module with its exciting capabilities will significantly help to reduce mask registration errors on arbitrary production features,” said Dr. Dirk Beyer, product manager for PROVE at Carl Zeiss SMS GmbH.

Registration errors can now be quantified for each mask with no resolution limitations, giving mask manufacturers a completely new tool for reducing placement errors in double patterning and mask-to-mask overlay.

“Synopsys’ collaboration with Carl Zeiss exemplifies our commitment to offering comprehensive lithography, inspection and metrology solutions to the mask manufacturing market”, said Fabio Angelillis, vice president of engineering for Synopsys’ Silicon Engineering Group. “By extending CATS to support PROVE, we are delivering higher quality metrology solutions to our customers at the 32-nanometer technology node and below.”

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