Online information source for semiconductor professionals

Cambridge NanoTech announces 100th ALD system delivery to Tata Institute

26 June 2008 | By Mark Osborne | News > Wafer Processing

Popular articles

New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011

Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008

‚??Velocity‚?? the new buzzword in Intel‚??s PQS annual awards - 12 April 2012

Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008

New Product: ASML Brion‚??s Tachyon MB-SRAF enables OPC-like compute times - 19 September 2011

CambridgeCambridge NanoTech has shipped its 100th ALD system to the Tata Institute of Fundamental Research (TIFR) in Mumbai, India, a major milestone for the company. The Savannah S100 will be used in the deposition of gate dielectric on nano-electric devices and in the coating of mesoporous structures. 

“This represents a significant milestone for us,” said Dr. Jill Becker, Founder, Cambridge NanoTech. “Not only is it our 100th system shipment, but also our first system shipped to India. Our business has grown consistently since our inception. We have recently added several key technologists to our team and have expanded our global customer service network to support our burgeoning business. This work at TIFR is indicative of the type of groundbreaking research ALD is enabling worldwide."

Related articles

Tyndall National Institute chooses Cambridge NanoTech‚??s Plasma ALD system - 22 July 2009

Tool Milestone: FEI sells 100th Titan TEM system - 06 May 2009

Milestone: Gigaphoton installs 100th ArF light source - 14 April 2008

Tool order: AIXTRON installs Rohm and Haas‚??s VaporStation central delivery system - 19 March 2009

Update: Vistec Lithography leaves UK for Ulbany NY - 20 October 2006

Reader comments

No comments yet!

Post your comment

Please enter the word you see in the image below: