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Brion and NuFlare collaborate to enhance mask equipment technology

06 November 2008 | By Syanne Olson | News > Lithography

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Brion Technologies is teaming up with NuFlare Technology, Inc. to design and develop new manufacturing technologies for next-generation semiconductor masks. Brion is using its Tachyon technology in order to look and tackle the challenges of mask equipment technology of the 32nm process node and beyond; NuFlare will then market the new products.

“NuFlare appreciates the contributions that Brion is making to the industry’s mask technology progress,” said Kinya Usuda, Director, Mask Inspection Equipment Division, at NuFlare. “This joint development effort, and ultimately our industry, will benefit from the combined strengths of these industry leaders.”

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