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Brion and Cymer push lithography modelling accuracy

26 February 2009 | By Mark Osborne | News > Lithography

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Brion, a division of ASML, and Cymer have collaborated on putting Cymer laser spectral characteristics into Brion’s computational lithography models to improve modelling for lithography related processes. This is the first time that this level of laser bandwidth characterization has been integrated into computational lithography products, according to the companies.

“ASML and Cymer have a long history of successful partnerships,” said Ed Brown, president and chief operating officer of Cymer, “Our work with Brion extends those partnerships into computational lithography, allowing information about our advanced light sources to be applied to photomask manufacturing. We look forward to further collaborations in order to uncover new solutions for lithography optimization.”

“This helps our industry by allowing more accurate models and will be embedded into all our computational lithography products by mid-year 2009,” said Jim Koonmen, general manager at Brion. “At advanced semiconductor nodes, every nanometer counts. This new level of accuracy will improve lithography process control.”

The work utilizes Cymer’s factory-measured data, and was said to have enhanced modelling accuracy in Brion’s new LithoTuner series of products.

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