Online information source for semiconductor professionals
BASF to work on 22nm wet chemical cleaning solutions with IMEC
Popular articles
â??Velocityâ?? the new buzzword in Intelâ??s PQS annual awards - 12 April 2012
Oberai discusses Magma’s move into solar PV yield management space - 29 August 2008
Applied Materials adds Jim Rogers to Board of Directors - 29 April 2008
New Product: Applied Materials new EUV reticle etch system provides nanometer-level accuracy - 19 September 2011
TSMC honors suppliers at annual Supply Chain Management Forum - 03 December 2008
BASF and IMEC are extending their collaboration for 22nm FEOL wet chemical cleaning solutions in an effort to boost chemical performance while reducing process complexity as well as the number of process steps.
With the adoption of metal transistors a wide range of different metal components exist, which require careful cleaning without causing damage to the structures.